Pressure measurement: Process Connections for Technical Gases and Vacuum Applications

In pressure measurement applications in the semiconductor industry, laboratories, or analytical environments, selecting the appropriate process connection is essential for reliable and safe operation.

VCR – for demanding gas applications

For measuring technical and high-purity gases, the DMP 331 can be equipped with a metal-sealed VCR connection. The metal seal eliminates the need for an elastomer in the process area, thereby reducing the risk of outgassing, permeation, and contamination. At the same time, the connection provides high chemical resistance and very low leak rates.
The VCR version is therefore particularly suitable for high-purity, aggressive, or reactive gases, such as those used in the semiconductor industry.

Small flange (KF) – for vacuum applications

For vacuum applications, the DMP 331 is available with a small-flange (KF) connection. Sealing is provided by an O-ring, while a clamp ring enables quick, tool-free installation and removal.
A wide range of adapters and accessories allows the KF version to be flexibly integrated into existing vacuum systems. It is therefore suitable for numerous industrial, laboratory, and analytical vacuum applications.
With VCR and KF, the DMP 331 offers two connection concepts tailored to different requirements: VCR for demanding gas applications and KF for flexible vacuum applications.

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